Title :
High-power 780 nm window diffusion stripe laser diodes fabricated by an open-tube two-step diffusion technique
Author :
Isshiki, Kunihiko ; Kamizato, Takeshi ; Takami, Akihiro ; Shima, Akihiro ; Karakida, Shohichi ; Matsubara, Hiroshi ; Susaki, Wataru
Author_Institution :
Mitsubishi Electr. Corp., Hyogo, Japan
fDate :
5/1/1990 12:00:00 AM
Abstract :
High-power and low-threshold-current GaAlAs lasers with a simple window structure fabricated by controllable open-tube two-step diffusion and single-step metalorganic chemical vapor deposition are discussed. The window structure and the waveguide with a narrow width around 2 μm are formed by diffusion of zinc, which just passes through an n-type active layer. CW output power up to 134 mW without catastrophic damage and a threshold current of 17 mA have been achieved. A maximum output power density of 16 MW/cm2 is estimated. A stable fundamental transverse mode of up to 100 mV in the wavelength range of 780 nm is obtained. Excellent uniformity of device characteristics is confirmed
Keywords :
III-V semiconductors; aluminium compounds; diffusion in solids; gallium arsenide; semiconductor junction lasers; vapour phase epitaxial growth; 134 mW; CW output power; III-V semiconductor; device characteristics; high power window diffusion stripe laser diodes; low threshold current GaAlAs lasers; maximum output power density; narrow width; open-tube two-step diffusion technique; simple window structure; single-step metalorganic chemical vapor deposition; stable fundamental transverse mode; threshold current; waveguide; wavelength range; Chemical vapor deposition; Diode lasers; Epitaxial layers; MOCVD; Optical control; Optical device fabrication; Power generation; Scanning electron microscopy; Semiconductor films; Zinc;
Journal_Title :
Quantum Electronics, IEEE Journal of