DocumentCode
1301761
Title
Frequency response of advanced silicon bipolar transistors at low temperature
Author
Jenkins, Keith A.
Author_Institution
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
37
Issue
10
fYear
1990
fDate
10/1/1990 12:00:00 AM
Firstpage
2243
Lastpage
2249
Abstract
The high-frequency behavior of advanced bipolar silicon transistors has been measured at temperatures between 83 and 350 K. The cutoff frequency, DC gain, and associated frequency-dependent parameters are reported. Although the transistors are optimized for room-temperature operation, their performance at liquid-nitrogen temperature is not severely degraded. Though decreased, the current gain remains sufficiently high for use in some applications. The cutoff frequency is reduced by about a factor of two. It is suggested that this is primarily due to an increase of the base transit time and that increasing the base doping may improve the low-temperature response. Using the maximum frequency of oscillation to predict circuit switching speed, it appears that small, high-performance transistors suffer a speed degradation at near liquid-nitrogen temperature
Keywords
bipolar transistors; elemental semiconductors; silicon; 83 to 350 K; DC gain; Si transistors; base doping; base transit time; bipolar transistors; circuit switching speed; current gain; cutoff frequency; frequency-dependent parameters; high-frequency behavior; liquid N2 temperature; low-temperature response; maximum frequency of oscillation; speed degradation; temperatures; Bipolar transistors; Circuits; Cutoff frequency; Degradation; Doping; Frequency measurement; Frequency response; Gain measurement; Silicon; Temperature measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.59915
Filename
59915
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