DocumentCode
1302708
Title
New methodologies for measuring film thickness, coverage, and topography
Author
Mate, C. Mathew ; Yen, Bing K. ; Miller, Dolores C. ; Toney, Mike F. ; Scarpulla, Mike ; Frommer, Jane E.
Author_Institution
IBM Almaden Res. Center, San Jose, CA, USA
Volume
36
Issue
1
fYear
2000
Firstpage
110
Lastpage
114
Abstract
We describe how the techniques of X-ray reflectivity (XRR), electron spectroscopy for chemical analysis (ESCA), and atomic force microscopy (AFM) can be used to obtain the structural parameters-thickness, coverage, and topography-of thin films used on magnetic recording disks. We focus on ultra-thin amorphous nitrogenated carbon (CNx) overcoats on disks. Each technique has its own strengths: XRR measures film thickness absolutely, ESCA determines the chemical composition of the films, and AFM maps topography accurately. For the CNx overcoats investigated, we find incomplete coverage for thicknesses less than 20 Å, and we find a small surface roughness with rms roughness ≤11 Å.
Keywords
ESCA; X-ray reflection; atomic force microscopy; carbon compounds; magnetic disc storage; protective coatings; surface topography measurement; thickness measurement; CN; CNx thin film; ESCA; X-ray reflectivity; atomic force microscopy; chemical composition; coverage measurement; magnetic recording disk; structural parameters; surface roughness; thickness measurement; topography measurement; ultrathin amorphous nitrogenated carbon overcoat; Atomic force microscopy; Atomic measurements; Chemical analysis; Electrons; Magnetic films; Optical films; Reflectivity; Spectroscopy; Surfaces; Thickness measurement;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.824434
Filename
824434
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