• DocumentCode
    1303321
  • Title

    A High-Speed Low-Power Multi-VDD CMOS/SIMOX SRAM With LV-TTL Level Input/Output Pins—Write/Read Assist Techniques for 1-V Operated Memory Cells

  • Author

    Shibata, Nobutaro ; Watanabe, Mayumi ; Okiyama, Hideomi

  • Author_Institution
    Microsyst. Integration Labs., NTT Corp., Atsugi, Japan
  • Volume
    45
  • Issue
    9
  • fYear
    2010
  • Firstpage
    1856
  • Lastpage
    1869
  • Abstract
    The use of multiple power supplies with different output voltages has a great advantage in that it makes it possible to realize high performance ULSIs with low power dissipation. This paper presents a high-speed low-power SRAM that employs three power supplies (1, 2, and 3.3 V). A 1-V power supply is mainly used in the SRAM core to save standby and/or active power, while a 2-V supply is used in critical components to realize high performance. The voltage applicable to each MOSFET is up to 2.2 V because of the use of a 5-nm ultrathin gate oxide, and so the 3.3-V power supply is used only for LV-TTL level I/O buffers. Secure write operation for 1-V six-transistor memory cells is guaranteed by using a new switched powerline impedance scheme. To reduce dynamic write power dissipation, a segmented bitline scheme is adopted and long global bitlines are assigned to the 4th (topmost) metal layer. The data stored in memory cells are read out via virtual-GND lines by sensing the change in current volume. The practical use of parasitic bipolar action in SOI MOSFETs is being actively considered as a way of obtaining a large read current from memory cells. In addition, a 1-V double-rail bidirectional intradatabus is developed for transferring multibit high-speed data between the SRAM core and I/O buffers. A 32K-word × 9-bit SRAM chip, fabricated with the 0.2-μm-gate CMOS/SIMOX process, has achieved a 7.5-ns address access time for 65-pF external loads. The power dissipation during standby is less than 0.3 mW and the values for 100-MHz operation are 5.8 mW (write) and 11.0 mW (read), excluding that of the 3.3-V I/O buffers.
  • Keywords
    CMOS integrated circuits; MOSFET; SIMOX; SRAM chips; LV-TTL level input/output pins; MOSFET; SOI MOSFET; ULSI; address access time; double-rail bidirectional intradatabus; frequency 100 MHz; multiVDD CMOS SRAM; multiVDD SIMOX SRAM; multiple power supplies; output voltages; power 11 mW; power 5.8 mW; power dissipation; segmented bitline scheme; six-transistor memory cells; size 0.2 mum; size 5 nm; switched powerline impedance scheme; time 7.5 ns; ultrathin gate oxide; virtual-GND lines; voltage 1 V; voltage 2 V; voltage 3.3 V; write/read assist techniques; CMOS integrated circuits; Decoding; Metals; Power dissipation; Power supplies; Random access memory; Switches; CMOS; LV-TTL; SIMOX; SRAM; current sense; fully depleted SOI; high speed; low power; multi-VDD; segmented bitline; squashed memory cell; switched powerline impedance;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.2010.2051262
  • Filename
    5556423