DocumentCode
1303601
Title
Mechanism for recoverable power drift in PHEMTs
Author
Leoni, Robert E., III ; Bao, Jianwen ; Bu, Jiankang ; Du, Xiaohang ; Shirokov, Mikhail S. ; Hwang, James C M
Author_Institution
Raytheon Co., Andover, MA, USA
Volume
47
Issue
3
fYear
2000
fDate
3/1/2000 12:00:00 AM
Firstpage
498
Lastpage
506
Abstract
A new degradation mechanism is proposed for output power drift under rf overdrive of pseudomorphic high electron mobility transistors (PHEMT´s). Similar to the previously reported power-slump mechanism, the gradual reduction in output power is caused by a decrease in the peak drain current. However, unlike power slump that is usually associated with permanent damage, in the present case the output power recovers readily once the rf input is interrupted. A possible mechanism for power drift involves charge trapping in the surface passivation layer. The passivation charge relaxes the electrical field in the semiconductor, which in turn increases the occupation of the interface states between the passivation and semiconductor. Measurements of dc and pulsed current-voltage (I-V) characteristics, rf large signal waveforms, deep level transient spectroscopy, light and temperature effects, as well as metal-insulator-metal leakage support this supposition
Keywords
UHF field effect transistors; deep level transient spectroscopy; electron traps; interface states; leakage currents; microwave field effect transistors; microwave power transistors; passivation; power HEMT; semiconductor device measurement; PHEMTs; charge trapping; deep level transient spectroscopy; degradation mechanism; interface states; metal-insulator-metal leakage; output power drift; peak drain current; pseudomorphic high electron mobility transistors; pulsed current-voltage characteristics; recoverable power drift; rf large signal waveforms; rf overdrive; surface passivation layer; Current measurement; Degradation; Electron mobility; HEMTs; Interface states; MODFETs; PHEMTs; Passivation; Power generation; Pulse measurements;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.824715
Filename
824715
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