Title :
NLDMOS ESD Scaling Under Human Metal Model for 40-V Mixed-Signal Applications
Author :
Malobabic, Slavica ; Salcedo, Javier A. ; Hajjar, Jean-Jacques ; Liou, Juin J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Central Florida, Orlando, FL, USA
Abstract :
Electrostatic discharge (ESD) robustness of LDMOS (laterally diffused MOS) devices is found to be highly dependent on the type of ESD stress. In particular, the device´s ESD robustness does not scale with the device width, and this condition is substantially aggravated during the International Electrotechnical Commission (IEC) 61000-4-2 stress condition. IEC 61000-4-2 is a system-level ESD standard increasingly being adopted in the industry for ESD robustness assessment at the integrated circuit level. A comprehensive evaluation under the IEC 61000-4-2 stress impacting precision circuit designs is introduced in this letter for variable width LDMOS devices fabricated in a 0.18-μm bipolar-CMOS-DMOS process for 40-V mixed-signal applications.
Keywords :
CMOS integrated circuits; IEC standards; MIS devices; bipolar integrated circuits; electrostatic discharge; integrated circuit design; mixed analogue-digital integrated circuits; IEC 61000-4-2 stress condition; International Electrotechnical Commission 61000-4-2 stress condition; NLDMOS ESD scaling; bipolar-CMOS-DMOS process; electrostatic discharge; human metal model; integrated circuit level; laterally diffused MOS device; mixed-signal application; size 0.18 mum; voltage 40 V; Electrostatic discharges; IEC standards; Logic gates; MOS devices; Robustness; Stress; Electrostatic discharge (ESD); human metal model (HMM); laterally diffused MOS (LDMOS);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2012.2213574