DocumentCode :
1303934
Title :
Low-Cost Nanolithography
Author :
Mai, John ; Tsai, Rung-Ywan ; Yang, Chin-Tien
Volume :
5
Issue :
3
fYear :
2011
Firstpage :
25
Lastpage :
28
Abstract :
"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as an exposure light source, and hence we might need to circumvent some laws of physics along the way." This was the challenge posed almost six years ago by Jau-Jiu Ju to his team working at the Electronics and Optoelectronics Laboratories (EOL) in Hsinchu, Taiwan. The EOL is a research center within the Industrial Technology Research Institute (ITRI).
Keywords :
mass production; nanolithography; optoelectronic devices; ultraviolet sources; EOL research center; Electronics and Optoelectronics Laboratories; commercial mass production; exposure light source; extreme ultraviolet; low-cost nanolithography; nanolithography-based mastering process; physics; visible light; Cost benefit analysis; Electron beams; Lithography; Manufacturing processing; Nanolithography; Production planning;
fLanguage :
English
Journal_Title :
Nanotechnology Magazine, IEEE
Publisher :
ieee
ISSN :
1932-4510
Type :
jour
DOI :
10.1109/MNANO.2011.941953
Filename :
5993586
Link To Document :
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