Title :
The Nonlinear Impairments Due to the Data Correlation Among Sub-Carriers in Coherent Optical OFDM Systems
Author :
Qiu, Wenbo ; Yu, Song ; Zhang, Jie ; Shen, Jing ; Li, Weilin ; Guo, Hong ; Gu, Wanyi
Author_Institution :
Key Lab. of Inf. Photonics & Opt. Commun. (Minist. of Educ.), Beijing Univ. of Posts & Telecommun., Beijing, China
Abstract :
Resulted from the narrow frequency interval, the nonlinear impairments are strongly related with the data correlation of the optical orthogonal frequency division (OFDM) symbol in coherent optical OFDM (CO-OFDM) system, which is very different from the traditional WDM optical communication systems. The concept of normalized accumulative correlation coefficient (NACC) is proposed to evaluate the data correlation of the OFDM symbol. The parameter phi is presented to describe the influence of the systematic physical configuration on the nonlinear impairments. The dependence of the nonlinear impairments on the data correlation is investigated and revealed analytically. Closed form expressions are presented to calculate the noise spectrum, total nonlinear noise energy and noise signal ratio (NSR) under the condition that phi les 0.2, which is valid for most practical CO-OFDM system. The NSR is proportional to the NACC and phi2. Simulation results are well consistent with analytical calculations when phi les 0.2.
Keywords :
OFDM modulation; optical correlation; optical fibre communication; optical modulation; optical noise; subcarrier multiplexing; OFDM symbol; closed form expression; coherent optical OFDM system; data correlation; noise signal ratio; noise spectrum; nonlinear impairment; nonlinear noise energy; normalized accumulative correlation coefficient; optical orthogonal frequency division multiplexing; sub-carrier multiplexing; systematic physical configuration; Coherent optical orthogonal frequency division multiplexing (CO-OFDM); data correlation; noise signal ratio (NSR); nonlinear impairments; normalized accumulative correlation coefficient (NACC);
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2009.2030694