DocumentCode
1304726
Title
High-power CW operation of broad area InGaAlP visible light laser diodes
Author
Itaya, Kazuhiko ; Hatakoshi, G. ; Watanabe, Yoshihiro ; Ishikawa, Masatoshi ; Uematsu, Yutaka
Author_Institution
Toshiba Res. & Dev. Center, Kawasaki, Japan
Volume
26
Issue
3
fYear
1990
Firstpage
214
Lastpage
215
Abstract
Broad area InGaAlP visible light laser diodes with antireflection and high-reflection coatings have been fabricated. High power CW operation above 300 mW was obtained at 2 degrees C heat-sink temperature. This value corresponded to a light power density of 2.7 MW/cm2. The far field pattern showed a single lobe shape for output power up to 100 mW.
Keywords
III-V semiconductors; aluminium compounds; antireflection coatings; gallium compounds; indium compounds; semiconductor junction lasers; 100 to 300 mW; 2 degC; CW operation; InGaAlP; antireflection coatings; broad area; far field pattern; heat-sink temperature; high power operation; high-reflection coatings; semiconductor lasers; single lobe shape; visible light laser diodes;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19900144
Filename
82562
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