DocumentCode :
1305750
Title :
Micromachined silicon resonant strain gauges fabricated using SOI wafer technology
Author :
Beeby, Steve P. ; Ensell, Graham ; Baker, Brian R. ; Tudor, M. John ; White, Neil M.
Author_Institution :
Dept. of Electron. & Comput. Sci., Southampton Univ., UK
Volume :
9
Issue :
1
fYear :
2000
fDate :
3/1/2000 12:00:00 AM
Firstpage :
104
Lastpage :
111
Abstract :
The optimum mode of double-ended tuning-fork-style resonators is a lateral vibration in the plane of the wafer. Lateral vibrations are typically excited using the comb drive approach, but this requires modification to the resonator structure. This paper reports a simple method for exciting and detecting lateral vibrations without modifying the resonator, thereby enabling the optimum dynamically balanced structure to be used. This approach uses plane electrodes positioned parallel to the resonator´s tines to excite the vibrations while the change in resistance along the length of the resonator enables the vibrations to be detected. Test devices have been fabricated in single-crystal silicon using the buried oxide in silicon-on-insulator wafers as a sacrificial layer. The resonators are 340-/spl mu/m long, 3-/spl mu/m thick with tines 2-/spl mu/m wide. The gap between the tines and the electrode is 2 /spl mu/m. Visual inspection in a scanning electron microscope and electrical tests have confirmed the validity of this approach.
Keywords :
buried layers; elemental semiconductors; micromachining; micromechanical resonators; microsensors; scanning electron microscopy; silicon; silicon compounds; silicon-on-insulator; strain gauges; 2 mum; 3 mum; 340 mum; SOI wafer technology; Si-SiO/sub 2/; buried oxide; comb drive approach; double-ended tuning-fork-style resonators; electrical tests; lateral vibration; micromachined silicon resonant strain gauges; optimum dynamically balanced structure; optimum mode; plane electrodes; sacrificial layer; scanning electron microscopy; silicon-on-insulator wafers; single-crystal silicon; Capacitive sensors; Electrodes; Fabrication; Inspection; Mechanical sensors; Micromachining; Resonance; Silicon on insulator technology; Testing; Vibrations;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.825784
Filename :
825784
Link To Document :
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