Title :
Direct observation of nano-sized defects in thin films formed by sputter deposition
Author :
Jeong, Eun-Wook ; Kwan, Se-Hun ; Cho, Kyung-Mox ; Kim, Kwang Ho ; Choe, Youngson ; Cho, Young-Rae
Author_Institution :
Dept. of Mater. Sci. & Eng., Pusan Nat. Univ., Busan, South Korea
Abstract :
The nano-sized defects in the barrier layer are considered as major pathway of water vapor. In this paper, Cr thin film was coated on the polyethylene terephthalate (PET) substrate. By application of atomic layer deposition (ALD) with an Al2O3 on the Cr thin film having nano-sized defects, a direct image of the nano-sized defects was observed by using CMP process and conductive AFM. The resolution of nano-sized defects in this study was about 30 nm. This newly developed observation technology applied by damascene process could be very usefully applied to the direct observation of defects in the coating layers fabricated by various deposition methods.
Keywords :
aluminium compounds; atomic force microscopy; atomic layer deposition; chemical mechanical polishing; chromium; sputtered coatings; surface structure; thin films; ALD; Al2O3; Cr; PET substrate; atomic layer deposition; barrier layer; chemical mechanical polishing; chromium thin film; coating layer defects; conductive AFM; polyethylene terephthalate; sputter deposition; thin film nanosized defects; water vapor pathway; Atomic layer deposition; Films; Positron emission tomography; Reliability; Silicon; Barrier layer; Element mapping; Nano-sized defect; Observation technology; Thin films;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
Conference_Location :
Birmingham
Print_ISBN :
978-1-4673-2198-3
DOI :
10.1109/NANO.2012.6321981
