DocumentCode
1306073
Title
Magnetic properties, microstructures, and corrosion resistance of high-saturation FeMoN and FeRhN films for recording heads
Author
Wang, Shan X. ; Sin, Kyusik ; Hong, Jongill ; Nguyentran, Lee
Author_Institution
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
Volume
36
Issue
2
fYear
2000
fDate
3/1/2000 12:00:00 AM
Firstpage
513
Lastpage
520
Abstract
We have investigated high-saturation FeMoN and FeRhN films, deposited by radio frequency-diode reactive sputtering on alumina-TiC substrates, for inductive head applications. A minimum coercivity of ~1.2 Oe is obtained in (Fe97.8Mo2.2)N films at a N 2/Ar flow ratio of ~6.2%. A minimum coercivity of ~1.6 Oe is obtained in (Fe96.9Rh3.1)N films at a N2/Ar flow ratio of ~4.6%. The films mainly consist of α-Fe phase and γ´-Fe4N phase; The magnetic properties of these films are stable under easy axis field annealing up to 350°C. Addition of Rh or Mo to FeN has resulted in a significant improvement in corrosion resistance over that of FeN. The localized corrosion resistance of FeRhN and FeMoN can be comparable to that of Permalloy. In contrast, their intrinsic corrosion resistance is inferior to that of Permalloy, but it can be adjusted and controlled by pH level
Keywords
annealing; coercive force; corrosion resistance; iron compounds; magnetic heads; magnetic thin films; molybdenum compounds; rhodium compounds; sputtered coatings; Al2O3; FeMoN; FeRhN; N2/Ar flow ratio; RF diode reactive sputtering; TiC; alumina-TiC substrates; coercivity; corrosion resistance; field annealing; high-saturation films; inductive head; microstructure; pH level; Argon; Coercive force; Corrosion; Iron; Magnetic films; Magnetic heads; Magnetic properties; Microstructure; Radio frequency; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.825827
Filename
825827
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