Title :
Radiation-induced gain degradation in lateral PNP BJTs with lightly and heavily doped emitters
Author :
Wu, A. ; Schrimpf, R.D. ; Barnaby, H.J. ; Fleetwood, D.M. ; Pease, R.L. ; Kosier, S.L.
Author_Institution :
Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA
fDate :
12/1/1997 12:00:00 AM
Abstract :
Radiation-induced gain degradation is compared in two types of lateral PNP bipolar devices that are identical except for the emitter doping. The devices with heavily-doped emitters (1×1020 cm-3) degrade less than the devices with lightly-doped emitters (1×1018 cm-3). Both device types are sensitive to interface-trap formation in the oxide above the emitter-base junction and the neutral base region. In addition, the devices with lightly-doped emitters experience spreading of the depletion region into the emitter, increasing their sensitivity to total-dose irradiation. The gain degradation in both device types is due to a combination of increased base current and decreased collector current. The radiation-induced decrease in collector current is more significant for devices from this technology than for other devices studied previously. Increased gain degradation is observed in heavily-doped devices irradiated at low dose rates, but the enhanced degradation appears to be due to time-dependent effects rather than true dose-rate effects. The lightly-doped devices do not exhibit a clear dose-rate trend and the gain of these devices improves during post-irradiation annealing
Keywords :
bipolar integrated circuits; bipolar transistors; electron traps; hole traps; interface states; radiation effects; surface recombination; base current; bipolar IC failure; bipolar junction transistors; collector current; depletion region spreading; dose-rate effects; emitter doping; emitter-base junction; heavily doped emitters; interface-trap formation; ionizing radiation; lateral PNP BJTs; lateral PNP bipolar devices; lightly doped emitters; post-irradiation annealing; radiation-induced gain degradation; time-dependent effects; total-dose irradiation sensitivity; Analog integrated circuits; Analytical models; Annealing; Character generation; Degradation; Doping; Ionizing radiation; Laboratories; Semiconductor process modeling;
Journal_Title :
Nuclear Science, IEEE Transactions on