DocumentCode :
1308824
Title :
An Adjusted Constant-Current Method to Determine Saturated and Linear Mode Threshold Voltage of MOSFETs
Author :
Bazigos, Antonios ; Bucher, Matthias ; Assenmacher, Joachim ; Decker, Stefan ; Grabinski, Wladyslaw ; Papananos, Yannis
Author_Institution :
Dept. of Electr. & Comput. Eng., Nat. Tech. Univ. of Athens, Athens, Greece
Volume :
58
Issue :
11
fYear :
2011
Firstpage :
3751
Lastpage :
3758
Abstract :
The constant-current (CC) method uses a current criterion to determine the threshold voltage (VTH) of metal-oxide-semiconductor (MOS) field-effect transistors. We show that using the same current criterion in both saturation and linear modes leads to inconsistent results and incorrect interpretation of effects, such as drain-induced barrier lowering in advanced CMOS halo-implanted devices. The generalized adjusted CC method is based on the theory of the charge-based MOS transistor model. It introduces an adjusted current criterion, depending on VDS, allowing to coherently determine VTH for the entire range of VDS from linear operation to saturation. The method uses commonly available ID versus VG data with focus on moderate inversion. The method is validated with respect to the ideal surface potential model, and its suitability is demonstrated with technology-computer-aided-design data from a 65-nm CMOS technology and measured data from a 90-nm CMOS technology. Comparison with other widely used threshold voltage extraction methods is provided.
Keywords :
CMOS integrated circuits; MOSFET; MOSFET; advanced CMOS halo-implanted devices; charge-based MOS transistor model; drain-induced barrier; generalized adjusted constant-current method; ideal surface potential model; linear mode threshold; metal-oxide-semiconductor field-effect transistors; saturated mode threshold; size 90 nm; technology-computer-aided-design data; threshold voltage extraction methods; CMOS integrated circuits; CMOS technology; Computational modeling; Electric potential; MOSFETs; Semiconductor device modeling; Threshold voltage; Charge-based model; metal–oxide–semiconductor field-effect transistor (MOSFET) compact model; moderate inversion; parameter determination; pocket implant; threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2164080
Filename :
6003772
Link To Document :
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