Title :
A Three-Dimensional Time-of-Flight CMOS Image Sensor With Pinned-Photodiode Pixel Structure
Author :
Kim, Seong-Jin ; Han, Sang-Wook ; Kang, Byongmin ; Lee, Keechang ; Kim, James D K ; Chang-Yeong Kim
Author_Institution :
Multimedia Lab., Samsung Electron. Co. Ltd., Yongin, South Korea
Abstract :
A pixel architecture for providing not only normal 2-D images but also depth information by using a conventional pinned photodiode is presented. This pixel architecture allows the sensor to generate a real-time 3-D image of an arbitrary object. The operation of the pixel is based on the time-of-flight principle detecting the time delay between the emitted and reflected infrared light pulses in a depth image mode. The pixel contains five transistors. Compared to the conventional 4-T CMOS image sensor, the new pixel includes an extra optimized transfer gate for high-speed charge transfer. A fill factor of more than 60% is achieved with a 12 × 12 μm2 size for increasing the sensitivity. A fabricated prototype sensor successfully captures 64 × 16 depth images between 1 and 4 m at a 5-MHz modulation frequency. The depth inaccuracy is measured under 2% at 1 m and 4% at 4 m and is verified by noise analysis.
Keywords :
CMOS image sensors; charge exchange; p-i-n photodiodes; spatial variables measurement; 2D image; depth information; high-speed charge transfer; infrared light pulse; modulation frequency; pinned-photodiode pixel structure; real-time 3D image; three-dimensional time-of-flight CMOS image sensor; time delay; Accuracy; CMOS image sensors; Logic gates; Noise; Photodiodes; Pixel; Transistors; 3-D pixel; CMOS image sensor; depth image; pinned photodiode; time-of-flight (TOF);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2066254