Title :
Measurement of wave-front aberrations in high-resolution optical lithographic systems from printed photoresist patterns
Author :
Yeung, Michael S.
Author_Institution :
Dept. of Manuf. Eng., Boston Univ., MA, USA
fDate :
2/1/2000 12:00:00 AM
Abstract :
A new method of measurement of wave-front aberrations in high-resolution optical lithographic systems used for semiconductor manufacturing is proposed. The method is based on the measurement of the positional shifts and focus offsets of a set of printed photoresist grating patterns with different periods and orientations, produced under nearly fully coherent illumination condition. The proposed experimental procedures are described in detail and various sources of systematic and random errors are discussed. It is estimated that a measurement precision of λ/50 for the wave-front aberrations at selected points on the lens pupil can be achieved with this method
Keywords :
aberrations; integrated circuit manufacture; lenses; photoresists; focus offsets; fully coherent illumination condition; high-resolution optical lithographic systems; lens pupil; measurement precision; periods; positional shifts; printed photoresist grating patterns; printed photoresist patterns; semiconductor manufacturing; systematic errors; wave-front aberrations; Lenses; Lithography; Manufacturing; Optical diffraction; Optical imaging; Optical interferometry; Position measurement; Printing; Resists; Wavelength measurement;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
