DocumentCode
1310988
Title
Vertically Integrated Unidirectional Biristor
Author
Moon, Dong-Il ; Choi, Sung-Jin ; Kim, Sungho ; Oh, Jae-Sub ; Kim, Young-Su ; Choi, Yang-Kyu
Author_Institution
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume
32
Issue
11
fYear
2011
Firstpage
1483
Lastpage
1485
Abstract
The unidirectional read-out characteristics of a two-terminal biristor are investigated through numerical simulations and experiments. The base doping profile in the biristor, which is analogous to an open-base bipolar junction transistor (BJT), is a key parameter to control both the multiplication factor and the common-emitter gain of the open-base BJT. The simulated results indicate that the asymmetric base doping produces a difference in the latch-up voltage according to the reading direction. A unidirectional conduction path is thereby implemented in a crossbar-array configuration that consists of only the two-terminal biristor. The experimental results based on a vertical structure with local charge injection support that the leakage path through the reverse read direction can be blocked by the asymmetric base doping structure with the selection of proper bias conditions.
Keywords
doping profiles; numerical analysis; resistors; asymmetric base doping structure; base doping profile; common-emitter gain; crossbar-array configuration; latch-up voltage; multiplication factor; numerical simulations; reverse read direction; unidirectional conduction; unidirectional read-out characteristics; vertically integrated unidirectional biristor; Arrays; Doping; Impact ionization; Junctions; Latches; Logic gates; Silicon; Biristor; bipolar junction transistor (BJT); bistable resistor; crossbar; open-base breakdown; two-terminal; vertical field-effect transistor (FET);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2163698
Filename
6006507
Link To Document