DocumentCode :
1311113
Title :
Frequency- and Temperature-Dependent Modeling of Coaxial Through-Silicon Vias for 3-D ICs
Author :
Wen-Sheng Zhao ; Wen-Yan Yin ; Xiao-Peng Wang ; Xiao-Long Xu
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Volume :
58
Issue :
10
fYear :
2011
Firstpage :
3358
Lastpage :
3368
Abstract :
Temperature-dependent investigations of circular and square coaxial through-silicon vias (C-TSVs) are carried out in this paper, which can provide an effective solution to suppressing various couplings, such as intra- and intersubstrate, and crosstalk among multi-TSVs. An equivalent lumped-element circuit model is proposed for both C-TSVs, and their parasitic capacitance values, per-unit-height distributed parameters, characteristic impedance values, and S-parameters are characterized and compared numerically for different frequencies and temperatures. Furthermore, self-heating effects in both C-TSVs are investigated with a set of closed-form equations derived for determining their thermal resistances. Their average power handling capabilities are addressed, which are verified using the static finite-element method.
Keywords :
S-parameters; distributed parameter networks; equivalent circuits; finite element analysis; three-dimensional integrated circuits; 3D IC; S-parameter; average power handling capability; characteristic impedance value; circular C-TSV; circular coaxial through-silicon vias; closed-form equation; coupling suppression; crosstalk; equivalent lumped-element circuit model; frequency-dependent modeling; intersubstrate; intrasubstratre; parasitic capacitance value; per-unit-height distributed parameter; self-heating effect; square C-TSV; square coaxial through-silicon vias; static finite-element method; temperature-dependent modeling; thermal resistance; Conductivity; Integrated circuit modeling; Parasitic capacitance; Silicon; Substrates; Through-silicon vias; Average power handling capability (APHC); coaxial through-silicon vias (C-TSVs); coupling; frequency- and temperature-dependent distributed parameters; lumped-element circuit model; metal–oxide–semiconductor (MOS) capacitance; self-heating effects;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2162848
Filename :
6006524
Link To Document :
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