• DocumentCode
    1311371
  • Title

    Positive temperature coefficient of breakdown voltage in 4H-SiC pn junction rectifiers

  • Author

    Neudeck, Philip G. ; Fazi, Christian

  • Author_Institution
    NASA Lewis Res. Center, Cleveland, OH, USA
  • Volume
    18
  • Issue
    3
  • fYear
    1997
  • fDate
    3/1/1997 12:00:00 AM
  • Firstpage
    96
  • Lastpage
    98
  • Abstract
    It has been suggested that once silicon carbide (SiC) technology overcomes some crystal growth obstacles, superior SiC semiconductor devices would supplant silicon in many high-power applications. However, the property of positive temperature coefficient of breakdown voltage, a behavior crucial to realizing excellent power device reliability, has not been observed in 4H-SiC, which is presently the best-suited SiC polytype for power device implementation. This paper reports the first experimental measurements of stable positive temperature coefficient behavior observed in 4H-SiC pn junction rectifiers. This research indicates that robust 4H-SiC power devices with high breakdown reliability should be achievable after SiC foundries reduce material defects such as micropipes, dislocations, and deep level impurities.
  • Keywords
    dislocations; electric breakdown; impurities; power semiconductor diodes; semiconductor device reliability; silicon compounds; solid-state rectifiers; wide band gap semiconductors; 4H-SiC p-n junction rectifiers; SiC; breakdown voltage; deep level impurities; dislocations; high breakdown reliability; material defects reduction; micropipes; positive temperature coefficient; power device reliability; stable behavior; Breakdown voltage; Electric breakdown; Impurities; NASA; Power system reliability; Pulse power systems; Rectifiers; Semiconductor diodes; Silicon carbide; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.556092
  • Filename
    556092