DocumentCode
1311371
Title
Positive temperature coefficient of breakdown voltage in 4H-SiC pn junction rectifiers
Author
Neudeck, Philip G. ; Fazi, Christian
Author_Institution
NASA Lewis Res. Center, Cleveland, OH, USA
Volume
18
Issue
3
fYear
1997
fDate
3/1/1997 12:00:00 AM
Firstpage
96
Lastpage
98
Abstract
It has been suggested that once silicon carbide (SiC) technology overcomes some crystal growth obstacles, superior SiC semiconductor devices would supplant silicon in many high-power applications. However, the property of positive temperature coefficient of breakdown voltage, a behavior crucial to realizing excellent power device reliability, has not been observed in 4H-SiC, which is presently the best-suited SiC polytype for power device implementation. This paper reports the first experimental measurements of stable positive temperature coefficient behavior observed in 4H-SiC pn junction rectifiers. This research indicates that robust 4H-SiC power devices with high breakdown reliability should be achievable after SiC foundries reduce material defects such as micropipes, dislocations, and deep level impurities.
Keywords
dislocations; electric breakdown; impurities; power semiconductor diodes; semiconductor device reliability; silicon compounds; solid-state rectifiers; wide band gap semiconductors; 4H-SiC p-n junction rectifiers; SiC; breakdown voltage; deep level impurities; dislocations; high breakdown reliability; material defects reduction; micropipes; positive temperature coefficient; power device reliability; stable behavior; Breakdown voltage; Electric breakdown; Impurities; NASA; Power system reliability; Pulse power systems; Rectifiers; Semiconductor diodes; Silicon carbide; Temperature;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.556092
Filename
556092
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