DocumentCode
1316343
Title
Enhanced Performance in Epitaxial Graphene FETs With Optimized Channel Morphology
Author
Yu-Ming Lin ; Farmer, Damon B. ; Jenkins, Keith A. ; Yanqing Wu ; Tedesco, J.L. ; Myers-Ward, Rachael L. ; Eddy, Charles R. ; Gaskill, D. Kurt ; Dimitrakopoulos, Christos ; Avouris, Phaedon
Author_Institution
IBM T J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
32
Issue
10
fYear
2011
Firstpage
1343
Lastpage
1345
Abstract
This letter reports the impact of surface morphology on the carrier transport and radio-frequency performance of graphene FETs formed on epitaxial graphene synthesized on SiC substrates. Such graphene exhibits long terrace structures with widths between 3-5 μm and steps of 10 ± 2 nm in height. While a carrier mobility value above 3000 cm2/V·s at a carrier density of 1012 cmx2 is obtained in a single graphene terrace, the step edges can result in a step resistance of ~21 kΩ·μm. By orienting the transistor layout so that the entire channel lies within a single graphene terrace and by reducing the access resistance associated with the ungated part of the channel, a cutoff frequency above 200 GHz is achieved for graphene FETs with channel lengths of 210 nm, i.e., the highest value reported on epitaxial graphene thus far.
Keywords
circuit layout; graphene; millimetre wave field effect transistors; silicon compounds; surface morphology; SiC; access resistance reduction; carrier density; carrier mobility value; carrier transport; channel morphology optimization; epitaxial graphene FET; field-effect transistor; radiofrequency performance; single graphene terrace; size 210 nm; surface morphology; transistor layout; Epitaxial growth; FETs; Logic gates; Morphology; Performance evaluation; Silicon carbide; Field-effect transistor (FET); graphene; radio-frequency (RF);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2162934
Filename
6012508
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