DocumentCode :
1316484
Title :
The Effect of Adjacent Bit-Line Cell Interference on Random Telegraph Noise in nand Flash Memory Cell Strings
Author :
Joe, Sung-Min ; Jeong, Min-Kyu ; Jo, Bong-Su ; Han, Kyoung-Rok ; Park, Sung-Kye ; Lee, Jong-Ho
Author_Institution :
Inter-Univ. Semicond. Res. Center, Seoul Nat. Univ., Seoul, South Korea
Volume :
59
Issue :
12
fYear :
2012
Firstpage :
3568
Lastpage :
3573
Abstract :
The effect of adjacent bit-line (BL) cell interference on BL current fluctuation (ΔIBL = high IBL - low IBL) due to random telegraph noise (RTN) in floating-gate nand Flash cell strings is characterized. It was found that the electron current density (Je) of a read cell can be appreciably different depending on the position in the channel width direction because of the interference from adjacent BL cells. The interference can be controlled by the state (program or erase) of the adjacent cells. We verified that ΔIBL due to RTN increases as a high-Je position is controlled to be close to a trap position in 32-nm nand Flash memory strings. Finally, it was also shown that the adjacent cell interference affects not only ΔIBL but also the ratio of capture and emission time constants [ln(τce)].
Keywords :
adjacent channel interference; flash memories; logic gates; noise; telegraphy; BL current fluctuation; NAND flash memory cell string; adjacent bit-line cell interference effect; channel width direction; floating-gate NAND flash cell string; high-Je position; random telegraph noise; Electron devices; Electron traps; Electrostatics; Flash memory; Interference; Logic gates; Noise measurement; BL interference; Bit-line (BL) current fluctuation; capture and emission; floating gate; nand Flash memory; random telegraph noise (RTN);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2219866
Filename :
6329941
Link To Document :
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