DocumentCode
1317464
Title
Performance Characteristics of Scaled Bilayer Graphene Pseudospin Devices
Author
Gilbert, M.J.
Author_Institution
Univ. of Illinois, Urbana, IL, USA
Volume
57
Issue
11
fYear
2010
Firstpage
3059
Lastpage
3067
Abstract
In this paper, we examine the performance characteristics of bilayer graphene pseudospin devices as we scale the layer width of the monolayers of graphene which comprise the bilayer structure. We find that, for layer widths of 30 nm, the device performance can exceed analytical predictions due to thermal smoothing of the interlayer interactions. However, when the device is further scaled to 20 nm and below, we find an appreciable drop of the maximum current the device can sustain when compared with the predicted values which result from increased quantum interference between injected quasi-particles and those reflected off of the excitonic gap opened at the Fermi energy. These results provide important insight into the maximum achievable performance characteristics and optimal device-design parameters for this promising potential post-CMOS logic device.
Keywords
CMOS integrated circuits; Fermi level; MOSFET; graphene; logic devices; monolayers; quasiparticles; C; Fermi energy; bilayer structure; excitonic gap; graphene monolayers; injected quasiparticles; interlayer interactions; optimal device-design parameters; post-CMOS logic device; quantum interference; scaled bilayer graphene pseudospin devices; thermal smoothing; Critical current; Nanoelectronics; Silicon; Switches; Tunneling; Beyond complementary metal–oxide–semiconductor (CMOS); bilayer; graphene; nanoelectronics; tunneling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2065807
Filename
5567138
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