DocumentCode :
1317678
Title :
Efficient Use of \\hbox {CO}_{2} Reforming of Methane With an Arc-Jet Plasma
Author :
Hwang, Nakyung ; Song, Young-Hoon ; Cha, Min Suk
Author_Institution :
Dept. of Environ. Syst. Eng., Univ. of Sci. & Technol., Daejeon, South Korea
Volume :
38
Issue :
12
fYear :
2010
Firstpage :
3291
Lastpage :
3299
Abstract :
Carbon dioxide reforming of methane has drawn the attention of many researchers for years, because of both its theoretical yield of hydrogen to carbon monoxide, i.e., H2/CO = 1, and the use of greenhouse gas CO2 . Although catalytic processes have been widely investigated, plasma-based techniques were recently considered, because catalytic processes have problems, such as coking and slow start-up time. However, since there is a lack of concrete information about plasma-induced processes, we systematically tested a dry reforming of methane by using an arc-jet plasma reactor. The effects of supplied power for plasma generation, CO2/CH4 ratio, O2 addition, and the amount of CH4 + CO2 in the reactant were experimentally investigated in nitrogen balance. As a result, the H2/CO ratio of a product can be controlled in the range of 0.8-2.5, and the direction for efficient use of the dry reforming process was proposed. Detailed mechanism and characteristics of the dry reforming of methane were also discussed.
Keywords :
carbon compounds; catalysis; organic compounds; plasma chemistry; plasma jets; plasma materials processing; plasma production; steam reforming; CO2; arc-jet plasma reactor; carbon dioxide reforming; carbon dioxide/methane ratio; catalytic processes; coking; dry reforming process; greenhouse gas; hydrogen/carbon monoxide ratio; nitrogen balance; oxygen addition; plasma generation; plasma-based techniques; plasma-induced processes; slow start-up time; supplied power; Carbon dioxide; Inductors; Methane; Nitrogen; Oxidation; Plasma temperature; Water; Arc jet; carbon dioxide; dry reforming; methane; plasma;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2010.2064179
Filename :
5567168
Link To Document :
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