DocumentCode :
1317702
Title :
Universal impurity ionization parameters in MIS C-V freeze-out characteristics and direct extraction of surface doping concentration
Author :
Bouillon, Pierre ; Gwoziecki, Romain ; Skotnicki, Thomas ; Alieu, Jerome ; Gentil, Pierre
Author_Institution :
Dept. of Device & Yield Eng., ST Microelectron., Crolles, France
Volume :
47
Issue :
4
fYear :
2000
fDate :
4/1/2000 12:00:00 AM
Firstpage :
871
Lastpage :
877
Abstract :
The carrier freeze-out is responsible for a kink-effect near the flat-band voltage in MIS capacitance-voltage (C-V) characteristics. By studying this phenomenon in depth, it has been demonstrated that the flat kink situation is governed by only two universal and constant parameters. Taking advantage of this particularity, a new method has been proposed and experimentally validated, aimed at extracting directly surface doping concentrations and impurity ionization energies
Keywords :
MIS structures; MOSFET; doping profiles; ionisation; In-doped NMOSFET; MIS C-V freeze-out characteristics; capacitance-voltage characteristics; constant parameters; direct extraction; flat-band voltage; impurity ionization energies; kink-effect; surface doping concentration; universal impurity ionization parameters; Capacitance; Capacitance-voltage characteristics; Doping; Helium; Ionization; MIS devices; MOSFETs; Semiconductor impurities; Temperature; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.831007
Filename :
831007
Link To Document :
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