• DocumentCode
    1318340
  • Title

    Measurement of field-induced refractive index variation in GaAs/AlGaAs superlattice using monolithic Fabry-Perot etalon

  • Author

    Law, K. -K ; Yan, R.H. ; Coldren, L.A. ; Merz, J.L.

  • Author_Institution
    Dept. of Electr. Comput. Eng., California Univ., Santa Barbara, CA, USA
  • Volume
    27
  • Issue
    2
  • fYear
    1991
  • Firstpage
    105
  • Lastpage
    106
  • Abstract
    The electrorefractive effect in a GaAs/AlGaAs superlattice was measured by using a monolithic Fabry-Perot structure, where the superlattice active region is embedded inside a cavity, formed by two quarter-wave stacks, all grown by molecular beam epitaxy. At the wavelength approximately 7675 AA, there is a large absorption change ( approximately 5400/cm) and an accompanying index change ( approximately 0.015) when the applied field change is approximately 100 kV/cm. In addition, the chirp parameter at this wavelength is less than 1. This result shows that superlattice electroabsorption optical modulation can offer relatively very low chirp.
  • Keywords
    III-V semiconductors; aluminium compounds; electroabsorption; gallium arsenide; optical modulation; refractive index measurement; semiconductor superlattices; GaAs-AlGaAs; MBE; cavity; chirp parameter; electro-optical effect; electrorefractive effect; field-induced refractive index variation; molecular beam epitaxy; monolithic Fabry-Perot etalon; quarter-wave stacks; superlattice active region; superlattice electroabsorption optical modulation;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19910070
  • Filename
    83146