DocumentCode
1318340
Title
Measurement of field-induced refractive index variation in GaAs/AlGaAs superlattice using monolithic Fabry-Perot etalon
Author
Law, K. -K ; Yan, R.H. ; Coldren, L.A. ; Merz, J.L.
Author_Institution
Dept. of Electr. Comput. Eng., California Univ., Santa Barbara, CA, USA
Volume
27
Issue
2
fYear
1991
Firstpage
105
Lastpage
106
Abstract
The electrorefractive effect in a GaAs/AlGaAs superlattice was measured by using a monolithic Fabry-Perot structure, where the superlattice active region is embedded inside a cavity, formed by two quarter-wave stacks, all grown by molecular beam epitaxy. At the wavelength approximately 7675 AA, there is a large absorption change ( approximately 5400/cm) and an accompanying index change ( approximately 0.015) when the applied field change is approximately 100 kV/cm. In addition, the chirp parameter at this wavelength is less than 1. This result shows that superlattice electroabsorption optical modulation can offer relatively very low chirp.
Keywords
III-V semiconductors; aluminium compounds; electroabsorption; gallium arsenide; optical modulation; refractive index measurement; semiconductor superlattices; GaAs-AlGaAs; MBE; cavity; chirp parameter; electro-optical effect; electrorefractive effect; field-induced refractive index variation; molecular beam epitaxy; monolithic Fabry-Perot etalon; quarter-wave stacks; superlattice active region; superlattice electroabsorption optical modulation;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19910070
Filename
83146
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