DocumentCode
1318715
Title
Impact Ionization Coefficients in
Author
Ong, Jennifer S L ; Ng, Jo S. ; Krysa, Andrey B. ; David, John P R
Author_Institution
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, Sheffield, UK
Volume
32
Issue
11
fYear
2011
Firstpage
1528
Lastpage
1530
Abstract
Electron and hole multiplication characteristics have been measured on a series of Al0.52In0.48P p+-i-n+ and n+-i-p+ homojunction diodes with nominal avalanche region thicknesses ranging from 0.22 to 1.03 μm. From these, the electron and hole impact ionization coefficients are deduced over an electric-field range from 530 to 990 kV/cm. The results suggest that the electron ionization coefficient is larger than the hole ionization coefficient, particularly at lower electric fields. Extremely low dark currents were obtained, and there was no evidence of any tunneling dark current even at electric fields of approximately 1.0 MV/cm. From these ionization coefficients, we deduce that the breakdown voltage in Al0.52In0.48P is almost 2.5× greater than that of GaAs and 4.5× lower than that of GaN.
Keywords
III-V semiconductors; aluminium compounds; electron impact ionisation; impact ionisation; indium compounds; Al0.52In0.48P; electron ionization coefficient; electron multiplication; hole ionization coefficient; hole multiplication; homojunction diodes; impact ionization coefficients; low dark currents; size 0.22 mum to 1.03 mum; Dark current; Gallium arsenide; Impact ionization; Photoconductivity; Semiconductor diodes; Avalanche multiplication; breakdown voltage; dark current; impact ionization coefficients;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2165520
Filename
6017097
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