DocumentCode :
1318798
Title :
AlGaAs-GaAs-InGaAs strained layer laser structure with performance independent of AlGaAs layer quality
Author :
Xin, Shujun ; Longenbach, K.F. ; Wang, W.I.
Author_Institution :
Dept. of Electr. Eng., Columbia Univ., New York, NY, USA
Volume :
27
Issue :
3
fYear :
1991
Firstpage :
199
Lastpage :
201
Abstract :
An AlGaAs-GaAs-InGaAs strained layer laser structure has been shown to have a low threshold current density which is independent of AlGaAs layer quality. This threshold invariance is attributed to the use of a large GaAs region outside the InGaAs well to reduce the effects of traps in the AlGaAs on the active region of the laser and was demonstrated by characterising identical structures grown by molecular beam epitaxy (MBE) under different AlGaAs growth conditions. These results should have strong implications for the reliability and manufacturability of such lasers and for the integration with electronic devices where low temperature growth is required.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; semiconductor junction lasers; semiconductor junctions; AlGaAs-GaAs-InGaAs strained layer laser structure; MBE; integration with electronic devices; large GaAs region; low temperature growth; low threshold current density; manufacturability; molecular beam epitaxy; reliability; semiconductors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910129
Filename :
83207
Link To Document :
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