DocumentCode :
1319044
Title :
Non-destructive measurements for CMOS devices using charge-collection techniques
Author :
Edmonds, Larry ; Swift, Gary ; Johnston, Alla
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Volume :
43
Issue :
6
fYear :
1996
fDate :
12/1/1996 12:00:00 AM
Firstpage :
2833
Lastpage :
2842
Abstract :
Results of an experiment providing initial validation of the use of charge-collection spectroscopy to measure the over-layer and epitaxial thickness and substrate diffusion length are given for several CMOS SRAM test devices
Keywords :
CMOS memory circuits; SRAM chips; integrated circuit measurement; CMOS SRAM device; charge-collection spectroscopy; epitaxial thickness; nondestructive measurement; over-layer thickness; substrate diffusion length; Charge measurement; Current measurement; Length measurement; Nuclear measurements; Semiconductor process modeling; Space technology; Spectroscopy; Substrates; Testing; Thickness measurement;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.556874
Filename :
556874
Link To Document :
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