DocumentCode :
1319856
Title :
Comparing MOS and bipolar integrated circuits
Author :
Warner, R.M., Jr.
Author_Institution :
Texas Instruments Incorporated
Volume :
4
Issue :
6
fYear :
1967
fDate :
6/1/1967 12:00:00 AM
Firstpage :
50
Lastpage :
58
Abstract :
In terms of speed and speed/power performance, bipolar integrated circuits are superior to metal-oxide-semiconductor integrated circuits. This superiority is based on the high transconductance inherent in bipolar transistors and is technology-independent. For the MOS case, transconductance is highly technology-dependent, and hence the performance difference will probably diminish in the future. Comparisons of the two technologies in their mid-1966 forms are made; the bipolar performance advantage in most cases is between 10 and 100. MOS integrated circuits have an area-per-function advantage ratio of about 5 for equivalent-function circuits, but a ratio of between 5 and 10 when circuits exploiting the unique MOS properties are considered. In addition, MOS processing is simpler than bipolar processing by approximately 40 percent.
Keywords :
Bipolar integrated circuits; Costs; Delay effects; Instruments; Integrated circuit technology; MOS integrated circuits; MOSFET circuits; Parasitic capacitance; Transconductance; Veins;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.1967.5215804
Filename :
5215804
Link To Document :
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