DocumentCode
1320188
Title
Wave soldering bumping process incorporating electroless nickel UBM
Author
Lin, Kwang-Lung ; Chen, Jun-Wen
Author_Institution
Dept. of Mater. Sci. & Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Volume
23
Issue
1
fYear
2000
fDate
3/1/2000 12:00:00 AM
Firstpage
143
Lastpage
150
Abstract
The Si/Ti/Cu/electroless nickel/solder bump was produced incorporating wave soldering without flux. The most suitable wave soldering condition for depositing solder is presented. The material interactions occurring during wave soldering, afterwards reflow, and extended heat treatment were found to produce Ni3Sn2 , Ni3Sn4, and Ni4Sn compounds between solder and electroless nickel deposit. The thickness of electroless nickel deposit required for being the barrier layer of the solder bump was investigated by reflow process
Keywords
electroless deposited coatings; flip-chip devices; nickel; wave soldering; Si-Ti-Cu-Ni; barrier layer; bumping process; compound formation; electroless nickel UBM; flip chip packaging; fluxless wave soldering; heat treatment; reflow process; under bump metallurgy; Chromium; Flip chip; Gold; Lead; Nickel; Packaging; Soldering; Sputtering; Surface tension; Tin;
fLanguage
English
Journal_Title
Components and Packaging Technologies, IEEE Transactions on
Publisher
ieee
ISSN
1521-3331
Type
jour
DOI
10.1109/6144.833053
Filename
833053
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