Title :
Effect of argon plasma treatment on conductivity of sol-gel fabricated Sb-doped SnO2 thin films
Author :
Kololuoma, T. ; Rantala, J.T.
Author_Institution :
VTT Electron., Oulu, Finland
fDate :
1/20/2000 12:00:00 AM
Abstract :
The sol-gel method is applied to the fabrication of antimony-doped tin dioxide thin films using SnCl4H2O and SbCl3 precursors. The effect of argon plasma treatment on the spin on fabricated thin films is studied as a function of the plasma treatment time. Changes in electrical conductivity are measured by a linear four-point probe method. The maximum increase in electrical conductivity is found to be 290%, from 138 to 400 S/cm. And the argon plasma reaction response time for the conductivity increase is fast. Finally, the reasons and mechanism for the noticeable resistivity decrease are discussed
Keywords :
antimony; electrical conductivity; plasma materials processing; semiconductor growth; semiconductor thin films; sol-gel processing; tin compounds; wide band gap semiconductors; Ar; SnO2:Sb; antimony-doped tin dioxide thin film; argon plasma treatment; electrical conductivity; sol-gel fabrication;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20000174