Extinction Ratio in Apertureless Reflection-Mode Magneto-Optical Scanning Near-Field Optical Microscopy

Author

Aoyagi, Mitsuharu ; Niratisairak, Sanyalak ; Sioda, Tatsutoshi ; Ishibashi, Takayuki

Author_Institution

Dept. of Mater. Sci. & Technol., Nagaoka Univ. of Technol., Nagaoka, Japan

Volume

48

Issue

11

fYear

2012

Firstpage

3670

Lastpage

3672

Abstract

We developed a reflection-mode scanning near-field optical microscopy (SNOM) with an apertureless probe with a high special resolution and a high extinction ratio. Patterned Chromium film with a checker pattern deposited on a quartz substrate was measured. In SNOM images, clear contrast between Chromium and quartz was obtained, and the spatial resolution was determined to be ~ 30 nm. A polarization property of scattered light from the near field was also investigated for both p- and s-polarized incidence. The extinction ratios for both polarization were found to be larger than 100.

Keywords

chromium; extinction coefficients; light polarisation; metallic thin films; near-field scanning optical microscopy; Cr; SiO₂; apertureless probe; apertureless reflection-mode magneto-optical scanning near-field optical microscopy; checker pattern; extinction ratio; p-polarized incidence; patterned chromium film; polarization property; quartz substrate; s-polarized incidence; scanning near-field optical microscopy images; scattered light; spatial resolution; Chromium; Measurement by laser beam; Optical diffraction; Optical imaging; Optical polarization; Optical scattering; Optical surface waves; Apertureless probe; magneto-optical effect; magneto-optical scanning near-field optical microscopy; polarization property; reflection-mode scanning near-field optical microscopy; scanning probe microscopy;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2012.2202384

Filename

6332757