DocumentCode :
1321875
Title :
Characterization of Interface Spin Clusters in Exchange Bias Systems
Author :
Cramp, N.C. ; Carpenter, R. ; O´Grady, K.
Author_Institution :
Dept. of Phys., Univ. of York, York, UK
Volume :
48
Issue :
11
fYear :
2012
Firstpage :
2881
Lastpage :
2884
Abstract :
In this paper, we report on the increase of exchange bias in Ir/Mn exchange biased systems due to an increase in the setting field. This is related to the size of interfacial spin clusters. Six samples of Si(100)/Ta(5 nm)/ Ru(5 nm)/IrMn(10 nm)/ CoFe(3 nm)/Ta(5 nm) of varying grain size were prepared by direct current (dc) sputtering. Magnetic measurements with increasing setting fields were taken along with grain size distribution measurements from TEM images. After the setting field had increased beyond the saturation magnetization of the ferromagnetic layer a continual increase in exchange bias was seen. This increase varied according to the size of the interfacial spin clusters.
Keywords :
cobalt alloys; elemental semiconductors; exchange interactions (electron); ferromagnetic materials; grain size; interface magnetism; iridium alloys; iron alloys; magnetic hysteresis; magnetic thin films; manganese alloys; metallic thin films; ruthenium; silicon; sputter deposition; superparamagnetism; tantalum; transmission electron microscopy; Si-Ta-Ru-IrMn-CoFe-Ta; TEM; direct current sputtering; exchange bias systems; ferromagnetic layer; grain size distribution measurements; interfacial spin clusters; magnetic hysteresis; magnetic measurements; saturation magnetization; size 10 nm; size 3 nm; size 5 nm; superparamagnetism; transmission electron microscopy; Grain size; Magnetic hysteresis; Magnetic resonance imaging; Perpendicular magnetic anisotropy; Saturation magnetization; Temperature measurement; Exchange bias; IrMn; thin film;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2012.2198455
Filename :
6332872
Link To Document :
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