Abstract :
This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.
Keywords :
actuators; integrated circuit manufacture; machine tools; mechatronics; photolithography; position control; SISO controller; actuator force decoupling; chip manufacturing; chip manufacturing industry; integrated circuit manufacture; lithographic equipment; lithographic tool; mechatronic architecture; position control; positioning accuracy requirement; single-input single-output controller; stage control; Integrated circuit manufacture; Lithography; Position control; Substrates; Wafer level packaging;
