DocumentCode
1324533
Title
Sub-micron camera for interdigital transducer fabrication
Author
Gregoris, D. ; Ristic, V.M.
Author_Institution
Dept. of Electr. Eng., Toronto Univ., Ont., Canada
Volume
10
Issue
1
fYear
1985
Firstpage
46
Lastpage
48
Abstract
Describes the structure and operation of a submicron resolution camera system for fabricating high frequency interdigital electrode transducers (IDTs). A high resolution, 10× reduction lens is central to the system which produces IDTs by direct optical projection lithography. The camera resolution was determined experimentally to be approximately 0.75 μm. The system was subsequently used to fabricate a modified chirp transducer with linewidths ranging from 1 μm to 2.4 μm.
Keywords
cameras; photolithography; transducers; SAW; interdigital electrode transducers; interdigital transducer fabrication; modified chirp transducer; optical projection lithography; photolithography camera; reduction lens; submicron resolution camera; Cameras; Electrodes; Fabrication; Optical filters; Optical surface waves; Substrates; Transducers;
fLanguage
English
Journal_Title
Electrical Engineering Journal, Canadian
Publisher
ieee
ISSN
0700-9216
Type
jour
DOI
10.1109/CEEJ.1985.6593138
Filename
6593138
Link To Document