Title :
Fully Room-Temperature-Fabricated Low-Voltage Operating Pentacene-Based Organic Field-Effect Transistors With HfON Gate Insulator
Author :
Liao, Min ; Ishiwara, Hiroshi ; Ohmi, Shun-ichiro
Author_Institution :
Dept. of Electron. & Appl. Phys., Tokyo Inst. of Technol., Yokohama, Japan
Abstract :
Low-voltage operating pentacene-based organic field-effect transistors (OFETs) with a HfON gate insulator have been fabricated with a fully room-temperature process. Despite its thin capacitance equivalent thickness of 3.3 nm, the room-temperature-processed HfON gate insulator shows a low leakage current density of 7 × 10-7 A/cm2 at a gate voltage of -2 V. Moreover, the fully room-temperature-fabricated OFET (channel W/L = 1650/100 μm) shows a low subthreshold swing of 0.12 V/decade, a large on/off-current ratio of 6.8 × 104, a threshold voltage of -0.5 V, and a hole mobility of 0.25 cm2/V·s at an operating voltage of -2 V.
Keywords :
hafnium compounds; low-power electronics; organic field effect transistors; plasma materials processing; sputtering; vacuum deposition; HfON; gate insulator; low voltage operation; organic field effect transistors; pentacene; temperature 293 K to 298 K; voltage -2 V; Dielectrics; Hafnium compounds; Insulators; Logic gates; OFETs; Pentacene; Electrical properties; high-$k$; organic field-effect transistors (OFETs); pentacene; room temperature;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2164776