DocumentCode
1325498
Title
Fabrication of buried corrugated waveguides by wafer direct bonding
Author
Pélissier, S. ; Pandraud, G. ; Mure-Ravaud, A. ; Tishchenko, A.V. ; Biasse, B.
Author_Institution
Lab. Traitement du Signal et Instrum., Univ. Jean Monnet, Saint-Etienne, France
Volume
18
Issue
4
fYear
2000
fDate
4/1/2000 12:00:00 AM
Firstpage
540
Lastpage
545
Abstract
A new fabrication method of deeply buried corrugated waveguides is presented. It uses a direct bonding process and allows us to make efficient grating couplers in waveguides. The efficiency of the grating is enhanced by enclosing air in its grooves during the fabrication process. A demonstrator based on a waveguide produced by ion exchange has been fabricated and tested. Theoretical and experimental results are compared.
Keywords
diffraction gratings; integrated optics; ion exchange; optical couplers; optical fabrication; optical testing; optical waveguides; wafer bonding; buried corrugated optical waveguide fabrication; deeply buried corrugated waveguides; grooves; ion exchange; optical grating couplers; optical testing; wafer direct bonding; Couplers; Glass; Gratings; Integrated optics; Optical coupling; Optical device fabrication; Optical filters; Optical waveguides; Silicon on insulator technology; Wafer bonding;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/50.838128
Filename
838128
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