DocumentCode :
1325665
Title :
Absorption at high microwave power by large-area Tl-based superconducting films on metallic substrates
Author :
Cooke, D.W. ; Arendt, P.N. ; Gray, E.R. ; Portis, A.M.
Author_Institution :
Los Alamos Nat. Lab., NM, USA
Volume :
39
Issue :
9
fYear :
1991
fDate :
9/1/1991 12:00:00 AM
Firstpage :
1539
Lastpage :
1544
Abstract :
Microwave surface resistance measurements have been made on large-area Ti-Ba-Ca-Cu-O thick films magnetron-sputtered onto oriented Ag alloy substrates by replacing the end wall of an 18 GHz TE011 mode Cu cavity with the superconducting film. The best surface resistance values obtained are 4 and 14 mΩ at 10 K and 77 K, respectively; corresponding Cu values are 8 and 21 mΩ. The dependence of the surface resistance on microwave power was measured in a similar way except that a Nb cavity was used instead of a Cu cavity. Typically, the surface resistance of the film begins to rise in 1-10 Oe of microwave field and saturates in 20-60 Oe. A model is presented relating the observed saturation to critical penetration of Josephson junctions. Films exhibiting the highest degree of c-axis texturing show the weakest dependence of surface resistance on power and also exhibit the sharpest transition to the superconducting state as measured at high frequency
Keywords :
barium compounds; calcium compounds; cavity resonators; electromagnetic wave absorption; high-temperature superconductors; sputtered coatings; superconducting thin films; thallium compounds; 10 K; 14 mohm; 18 GHz; 4 mohm; 77 K; Ag alloy substrates; Cu cavity; Nb cavity; Ti-Ba-Ca-Cu-O; c-axis texturing; high microwave power; high temperature superconductors; metallic substrates; surface resistance; Copper alloys; Electrical resistance measurement; Electromagnetic wave absorption; Josephson junctions; Power measurement; Saturation magnetization; Superconducting films; Superconducting magnets; Surface resistance; Thick films;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/22.83829
Filename :
83829
Link To Document :
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