• DocumentCode
    1325862
  • Title

    Survey of pulse shortening in high-power microwave sources

  • Author

    Benford, James ; Benford, Gregory

  • Author_Institution
    Microwave Sci., Lafayette, CA, USA
  • Volume
    25
  • Issue
    2
  • fYear
    1997
  • fDate
    4/1/1997 12:00:00 AM
  • Firstpage
    311
  • Lastpage
    317
  • Abstract
    Observations show that the ubiquitous pulse shortening in high-power microwave (HPM) devices arises from the formation of plasma, electron streaming, high-E-field breakdown, and beam disruption. We review recent experiments in terms of these causes. Linear beam devices exhibit all of these mechanisms; in particular, beam disruption by E×B drifts in the strong microwave fields and diffusion in turbulent electric fields appear common. In relativistic magnetrons, the dominant effect is resonance destruction by cathode plasma motion, possibly from water contamination of the surface. Wall plasma effects shorten pulses in most sources. We call for the introduction of improved surface conditioning, cathodes which do not produce plasmas, and increased effort on the measurements of the high-field and plasma properties of HPM sources. Because of the broad nature of the phenomena in pulse shortening, we appeal for increased participation of the plasma, intense particle beam, and traditional microwave tube communities in pulse-shortening research
  • Keywords
    magnetrons; microwave generation; microwave tubes; plasma production; plasma properties; plasma-wall interactions; relativistic electron beam tubes; beam disruption; cathode plasma motion; electron streaming; high-E-field breakdown; high-field properties; high-power microwave devices; high-power microwave sources; intense particle beam; linear beam devices; microwave tube; plasma formation; plasma properties; pulse shortening; relativistic magnetrons; resonance destruction; strong microwave fields; surface conditioning; turbulent electric fields; wall plasma effects; water contamination; Cathodes; Electric breakdown; Electron beams; Microwave devices; Particle beams; Plasma devices; Plasma measurements; Plasma properties; Plasma sources; Surface contamination;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.602505
  • Filename
    602505