DocumentCode
1326253
Title
A Physics-Based Compact Model for Polysilicon Resistors
Author
Spessot, Alessio ; Molteni, Mario ; Ventrice, Domenico ; Fantini, Paolo
Author_Institution
R&D Technol. Dev., Numonyx, Agrate Brianza, Italy
Volume
31
Issue
11
fYear
2010
Firstpage
1251
Lastpage
1253
Abstract
A physics-based compact model describing the electrothermal behavior of polysilicon resistors considering both the roles of the grain-boundary potential barriers and the transport inside the silicon decananocrystallites is presented. The model accurately captures the resistivity modulation as a function of temperature, dopant concentration, and grain size, including also the self-heating-induced nonlinear effects in the current-voltage relationship. An accurate agreement of the model against the experimental characterization is reported.
Keywords
grain boundaries; grain size; resistors; semiconductor doping; dopant concentration; electrothermal behavior; grain size; grain-boundary potential barriers; physics-based compact model; polysilicon resistors; Conductivity; Doping; Grain size; Resistors; Semiconductor process modeling; Thermal resistance; Compact modeling; electrothermal modeling; polysilicon; resistor;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2010.2066255
Filename
5575385
Link To Document