• DocumentCode
    1326253
  • Title

    A Physics-Based Compact Model for Polysilicon Resistors

  • Author

    Spessot, Alessio ; Molteni, Mario ; Ventrice, Domenico ; Fantini, Paolo

  • Author_Institution
    R&D Technol. Dev., Numonyx, Agrate Brianza, Italy
  • Volume
    31
  • Issue
    11
  • fYear
    2010
  • Firstpage
    1251
  • Lastpage
    1253
  • Abstract
    A physics-based compact model describing the electrothermal behavior of polysilicon resistors considering both the roles of the grain-boundary potential barriers and the transport inside the silicon decananocrystallites is presented. The model accurately captures the resistivity modulation as a function of temperature, dopant concentration, and grain size, including also the self-heating-induced nonlinear effects in the current-voltage relationship. An accurate agreement of the model against the experimental characterization is reported.
  • Keywords
    grain boundaries; grain size; resistors; semiconductor doping; dopant concentration; electrothermal behavior; grain size; grain-boundary potential barriers; physics-based compact model; polysilicon resistors; Conductivity; Doping; Grain size; Resistors; Semiconductor process modeling; Thermal resistance; Compact modeling; electrothermal modeling; polysilicon; resistor;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2066255
  • Filename
    5575385