• DocumentCode
    1326461
  • Title

    Activation energy of DC-drift of x-cut LiNbO3 optical intensity modulators

  • Author

    Nagata, Hirotoshi

  • Author_Institution
    Optoelectron. Res. Div., Sumitomo Osaka Cement Co. Ltd., Chiba, Japan
  • Volume
    12
  • Issue
    4
  • fYear
    2000
  • fDate
    4/1/2000 12:00:00 AM
  • Firstpage
    386
  • Lastpage
    388
  • Abstract
    The DC-bias-induced drift phenomenon in LiNbO/sub 3/ optical intensity modulators is a main cause of device wearout failure. In order to estimate the device lifetime, an activation energy value Ea of the drift is needed, and Ea=1.0 eV is already known for z-cut LiNbO/sub 3/ modulators. However, Ea of x-cut LiNbO/sub 3/ modulators is not known even though there is a possibility that the Ea depends on the crystal orientation. Here, Ea=1.4 eV is obtained experimentally for the x-cut LiNbO/sub 3/ modulator with a SiO/sub 2/ buffer layer from their drift measurements between 50/spl deg/C-140/spl deg/C.
  • Keywords
    crystal orientation; lithium compounds; optical fabrication; optical materials; optical modulation; optical testing; optical waveguide components; 50 to 140 C; DC-bias-induced drift phenomenon; DC-drift; LiNbO/sub 3/; LiNbO/sub 3/ optical intensity modulators; LiNbO/sub 3/:Ti; SiO/sub 2/; SiO/sub 2/ buffer layer; activation energy; activation energy value; crystal orientation; device lifetime; device wearout failure; drift measurements; optical intensity modulators; z-cut LiNbO/sub 3/ modulators; High speed optical techniques; Intensity modulation; Life estimation; Lifetime estimation; Optical buffering; Optical devices; Optical feedback; Optical modulation; Optical waveguides; Temperature;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.839027
  • Filename
    839027