Title :
Emission Efficiency Dependence on the p-GaN Thickness in a High-Indium InGaN/GaN Quantum-Well Light-Emitting Diode
Author :
Liao, Che-Hao ; Chen, Chih-Yen ; Chen, Horng-Shyang ; Chen, Kuang-Yu ; Chung, Wei-Lun ; Chang, Wen-Ming ; Huang, Jeng-Jie ; Yao, Yu-Feng ; Kiang, Yean-Woei ; Yang, Chih-Chung
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
The dependencies of quantum-well (QW) internal quantum efficiency (IQE) and device behaviors on the p-layer thickness in a high-indium InGaN/GaN QW light-emitting diode (LED) are demonstrated. During the high-temperature growths of the p-AlGaN and p-GaN layers, the QWs are thermally annealed to increase their IQEs and blue-shift the emission with increasing p-layer thickness. Meanwhile, the quantum-confined Stark effect is enhanced with increasing p-layer thickness to decrease the IQEs and red-shift the emission. Based on the counteraction between the two effects, the maximum IQE and the shortest emission wavelength are observed in a sample with an optimized p-layer thickness, which includes a p-AlGaN layer of 20 nm and a p-GaN layer of 60 nm in thickness under our growth conditions. The fabricated LEDs of different p-GaN thicknesses show the similar variation trends in emission efficiency and wavelength.
Keywords :
III-V semiconductors; aluminium compounds; annealing; indium compounds; light emitting diodes; quantum confined Stark effect; red shift; semiconductor quantum wells; wide band gap semiconductors; AlGaN; InGaN-GaN; InGaN/GaN quantum well; blue shift; emission efficiency dependence; high-temperature growths; internal quantum efficiency; light emitting diode; p-AlGaN layers; p-GaN thickness; p-layer thickness; quantum-confined Stark effect; red shift; thermal annealing; Annealing; Fluctuations; Gallium nitride; Indium; Light emitting diodes; Stark effect; Temperature measurement; Internal quantum efficiency (IQE); light-emitting diode (LED); p-GaN; quantum-confined Stark effect; thermal annealing;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2011.2169243