DocumentCode
1326703
Title
A precision vertical interconnect technology
Author
Greenstein, Michael ; Matta, Farid
Author_Institution
Hewlett Packard Lab., Palo Alto, CA, USA
Volume
14
Issue
3
fYear
1991
fDate
9/1/1991 12:00:00 AM
Firstpage
445
Lastpage
451
Abstract
An interconnection technology that utilizes excimer laser drilled vias and computer-controlled plating to provide vertical (Z-axis) electrical connections in high-performance flexible circuits is described. Specifically, solid vias and hemispherical microcontacts are created with a 1-μm nearest-neighbor height precision for the microcontacts. A novel structural architecture that simplifies the ground plane connections for impedance controlled flex circuits is used. The technology is particularly suitable in the DC to 2-GHz frequency range, where large numbers of parallel connections and or multiple make-and-break connections are desirable. This technology was implemented with a polyimide substrate and nickel contacts, although the technology is applicable to other substrate and contact metallurgies
Keywords
electric connectors; electroplating; laser beam machining; polymers; printed circuit accessories; 0 to 2 GHz; Ni contacts; computer-controlled plating; excimer laser drilled vias; ground plane connections; hemispherical microcontacts; high-performance flexible circuits; impedance controlled flex circuits; large numbers of parallel connections; mass interconnect; microcontacts; multiple make-and-break connections; polyimide substrate; precision vertical interconnect technology; solid vias; vertical electrical connections; Computer architecture; Conductors; Dielectric substrates; Fabrication; Filling; Flexible printed circuits; High performance computing; Impedance; Integrated circuit interconnections; Solids;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/33.83925
Filename
83925
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