A generic computer simulation model to characterize photolithography manufacturing area in an IC FAB facility

Author

Prasad, Kowdle

Author_Institution

Intel Corp., Chandler, AZ, USA

Volume

14

Issue

3

fYear

1991

fDate

9/1/1991 12:00:00 AM

Firstpage

483

Lastpage

487

Abstract

The technique used to develop a generic simulation model to characterize the photolithography manufacturing area in a semiconductor FAB facility is discussed. Use of simulation to study the impact of policy decisions on key manufacturing system parameters like product cycle time, line throughput, work-in-progress inventory, and utilizations are discussed. Details of the structured modeling approach taken to develop reusable simulation models are also discussed. The simulation model was successfully validated and the results presented

Keywords

digital simulation; integrated circuit manufacture; photolithography; production control; IC FAB facility; computer simulation model; line throughput; photolithography manufacturing area; product cycle time; reusable simulation models; structured modeling approach; work-in-progress inventory; Analytical models; Computer aided manufacturing; Computer simulation; Integrated circuit modeling; Lithography; Manufacturing processes; Materials handling; Power system modeling; Semiconductor device manufacture; Virtual manufacturing;

fLanguage

English

Journal_Title

Components, Hybrids, and Manufacturing Technology, IEEE Transactions on

Publisher

ieee

ISSN

0148-6411

Type

jour

DOI

10.1109/33.83931

Filename

83931