Title :
A 0.5-/spl mu/m, 3-V 1T1C, 1-Mbit FRAM with a variable reference bit-line voltage scheme using a fatigue-free reference capacitor
Author :
Ogiwara, R. ; Tanaka, Shoji ; Itoh, Yoshio ; Miyakawa, Takayuki ; Takeuchi, Yoshio ; Doumae, S.M. ; Takenaka, Hikaru ; Kunishima, I. ; Shuto, S. ; Hidaka, O. ; Ohtsuki, S. ; Tanaka, Shoji
Author_Institution :
ULSI Device Eng. Lab., Toshiba Corp., Yokohama, Japan
fDate :
4/1/2000 12:00:00 AM
Abstract :
A 0.5-/spl mu/m, 3-V operated, 1TIC, 1-Mbit FRAM with 160-ns access time has been developed. In FRAM, a reference voltage design using a ferroelectric capacitor is difficult because of the degradation due to fatigue, a chip-to-chip variation, and a temperature dependence. A variable reference voltage scheme is generated to solve this problem, boosting a fatigue-free and temperature-independent MOS reference capacitance by a driver. The driver is operated from a compact reference voltage generator that provides 32 equally divided voltages and occupies only half the layout area of a conventional one. During sense operation, memory-cell capacitance C/sub ferr/ is larger than reference-cell capacitance C/sub MOS/. A double word-line pulse scheme has also been developed to eliminate a bit-line capacitance imbalance in the bit-line pairs, where a memory cell and a reference cell are separated from the bit-line pairs during sense operation. A six-order improvement in imprint lifetime has been achieved by the new scheme.
Keywords :
ferroelectric capacitors; ferroelectric storage; random-access storage; reference circuits; 0.5 micron; 1 Mbit; 160 ns; 3 V; FRAM; access time; compact reference voltage generator; double word-line pulse scheme; equally divided voltages; fatigue-free reference capacitor; imprint lifetime; memory-cell capacitance; sense operation; variable reference bit-line voltage scheme; Capacitance; Degradation; Fatigue; Ferroelectric films; Ferroelectric materials; MOS capacitors; Nonvolatile memory; Random access memory; Temperature dependence; Voltage;
Journal_Title :
Solid-State Circuits, IEEE Journal of