DocumentCode :
1327833
Title :
A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation
Author :
Cheng, Yuhua ; Jeng, Min-Chie ; Liu, Zhihong ; Huang, Jianhui ; Chan, Mansun ; Chen, Kai ; Ko, Ping Keung ; Hu, Chenming
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Volume :
44
Issue :
2
fYear :
1997
fDate :
2/1/1997 12:00:00 AM
Firstpage :
277
Lastpage :
287
Abstract :
A new physical and continuous BSIM (Berkeley Short-Channel IGFET Model) I-V model in BSIM3v3 is presented for circuit simulation. Including the major physical effects in state-of-the art MOS devices, the model describes current characteristics from subthreshold to strong inversion as well as from the linear to the saturation operating regions with a single I-V expression, and guarantees the continuities of Ids, conductances and their derivatives throughout all Vgs, Vds, and Tbs, bias conditions. Compared with the previous BSIM models, the improved model continuity enhances the convergence property of the circuit simulators. Furthermore, the model accuracy has also been enhanced by including the dependencies of geometry and bias of parasitic series resistances, narrow width, bulk charge, and DIBL effects. The new model has the extensive built-in dependencies of important dimensional and processing parameters (e.g., channel length, width, gate oxide thickness, junction depth, substrate doping concentration, etc.). It allows users to accurately describe the MOSFET characteristics over a wide range of channel lengths and widths for various technologies, and is attractive for statistical modeling. The model has been implemented in the circuit simulators such as Spectre, Hspice, SmartSpice, Spice3e2, and so on
Keywords :
MOS integrated circuits; MOSFET; SPICE; VLSI; circuit analysis computing; doping profiles; integrated circuit modelling; mixed analogue-digital integrated circuits; semiconductor device models; BSIM3v3; Berkeley short-channel IGFET model; DIBL effects; Hspice; MOSFET characteristics; SmartSpice; Spectre; Spice3e2; analog/digital circuit simulation; bias conditions; channel length; convergence property; gate oxide thickness; junction depth; parasitic series resistances; physical effects; processing parameters; saturation operating regions; scalable I-V model; statistical modeling; strong inversion; substrate doping concentration; Art; Circuit simulation; Convergence; Digital circuits; Doping; MOS devices; MOSFET circuits; SPICE; Semiconductor process modeling; Solid modeling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.557715
Filename :
557715
Link To Document :
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