• DocumentCode
    1328043
  • Title

    An axisymmetric model for an RF plasma in contact with a surface having a nonuniform secondary electron emission coefficient

  • Author

    Xu, Weilu ; Sides, Paul J.

  • Author_Institution
    Tetrabond Multi-Arc Inc., Rockaway, NJ, USA
  • Volume
    24
  • Issue
    3
  • fYear
    1996
  • fDate
    6/1/1996 12:00:00 AM
  • Firstpage
    1072
  • Lastpage
    1078
  • Abstract
    An axisymmetric analytical model of an RF glow discharge was developed. This model allowed exploration of various effects: radial losses at the side wall, mismatch of secondary electron emission coefficients on the surface of a powered electrode, the aspect ratio and dimension of the plasma chamber, and operational parameters such as gas pressure and bias voltage. The plasma density decreased in most cases by a factor of two to three from the axis to the periphery as a consequence of the radial losses. A maximum in the radial plasma density distribution appeared when the substrate had a different secondary electron emission coefficient than the platen. A maximum in plasma density at the axis also appeared when the electrode separation was varied at constant electrode radius because the plasma diffusion loss between electrodes dominates when the electrode separation is small and plasma radial diffusion loss dominates when the electrode separation is large
  • Keywords
    glow discharges; high-frequency discharges; plasma collision processes; plasma density; plasma transport processes; plasma-wall interactions; secondary electron emission; RF glow discharge; RF plasma; aspect ratio; axisymmetric analytical model; axisymmetric model; bias voltage; electrode separation; gas pressure; nonuniform secondary electron emission coefficient; operational parameters; plasma chamber dimension; plasma density; plasma diffusion loss; powered electrode; radial losses; radial plasma density distribution; secondary electron emission coefficients; surface; Analytical models; Electrodes; Electron emission; Equations; Fault location; Heating; Plasma density; Plasma sheaths; Radio frequency; Surface discharges;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.533115
  • Filename
    533115