DocumentCode :
1328088
Title :
Low-Temperature a-Si:H/GaAs Heterojunction Solar Cells
Author :
Shahrjerdi, Davood ; Hekmatshoar, Bahman ; Sadana, Devendra K.
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
1
Issue :
1
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
104
Lastpage :
107
Abstract :
We propose a novel hydrogenated amorphous silicon (a-Si:H)/GaAs heterostructure for photovoltaic solar cells. The structure has two key advantages: 1) low-temperature processing and 2) a relatively low cost of cell fabrication compared with conventional junction structures that require epitaxial growth. We investigate the impact of different hydrogen dilution levels used during a-Si:H deposition on the electrical characteristics of heterojunction GaAs solar cells. It is interesting to note that epitaxial growth of silicon on GaAs occurred when relatively high hydrogen dilution levels were used. The prospect of silicon epitaxy in improving the cell performance is discussed.
Keywords :
III-V semiconductors; amorphous semiconductors; elemental semiconductors; epitaxial growth; gallium arsenide; hydrogen; semiconductor growth; semiconductor heterojunctions; silicon; solar cells; GaAs-Si:H; a-Si:H deposition; cell fabrication; cell performance; electrical characteristics; heterojunction GaAs solar cells; hydrogen dilution levels; hydrogenated amorphous silicon-GaAs heterostructure; low-temperature a-Si:H/GaAs heterojunction solar cells; low-temperature processing; photovoltaic solar cells; silicon epitaxial growth; silicon epitaxy; Epitaxial growth; Gallium arsenide; Passivation; Photovoltaic cells; Photovoltaic systems; Silicon; Heterojunction; photovoltaic solar cells;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2011.2164391
Filename :
6026890
Link To Document :
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