• DocumentCode
    1328088
  • Title

    Low-Temperature a-Si:H/GaAs Heterojunction Solar Cells

  • Author

    Shahrjerdi, Davood ; Hekmatshoar, Bahman ; Sadana, Devendra K.

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    1
  • Issue
    1
  • fYear
    2011
  • fDate
    7/1/2011 12:00:00 AM
  • Firstpage
    104
  • Lastpage
    107
  • Abstract
    We propose a novel hydrogenated amorphous silicon (a-Si:H)/GaAs heterostructure for photovoltaic solar cells. The structure has two key advantages: 1) low-temperature processing and 2) a relatively low cost of cell fabrication compared with conventional junction structures that require epitaxial growth. We investigate the impact of different hydrogen dilution levels used during a-Si:H deposition on the electrical characteristics of heterojunction GaAs solar cells. It is interesting to note that epitaxial growth of silicon on GaAs occurred when relatively high hydrogen dilution levels were used. The prospect of silicon epitaxy in improving the cell performance is discussed.
  • Keywords
    III-V semiconductors; amorphous semiconductors; elemental semiconductors; epitaxial growth; gallium arsenide; hydrogen; semiconductor growth; semiconductor heterojunctions; silicon; solar cells; GaAs-Si:H; a-Si:H deposition; cell fabrication; cell performance; electrical characteristics; heterojunction GaAs solar cells; hydrogen dilution levels; hydrogenated amorphous silicon-GaAs heterostructure; low-temperature a-Si:H/GaAs heterojunction solar cells; low-temperature processing; photovoltaic solar cells; silicon epitaxial growth; silicon epitaxy; Epitaxial growth; Gallium arsenide; Passivation; Photovoltaic cells; Photovoltaic systems; Silicon; Heterojunction; photovoltaic solar cells;
  • fLanguage
    English
  • Journal_Title
    Photovoltaics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    2156-3381
  • Type

    jour

  • DOI
    10.1109/JPHOTOV.2011.2164391
  • Filename
    6026890