Title :
Use of UV to reduce particle trapping in process plasmas
Author :
Rosenberg, M. ; Mendis, D.A.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., San Diego, La Jolla, CA, USA
fDate :
6/1/1996 12:00:00 AM
Abstract :
The use of ultraviolet (UV) radiation to reduce the negative charge on dust particles and modify force balance in particle traps in processing plasmas is investigated theoretically. Possible photophoresis associated with the UV flux is also discussed. The use of UV to facilitate moving contaminant particles from traps is considered
Keywords :
particle traps; photophoresis; plasma impurities; plasma transport processes; radiation pressure; UV flux; dust particles; force balance; negative charge reduction; particle trapping; photophoresis; process plasmas; ultraviolet radiation; Drag; Dusty plasma; Electrons; Electrostatics; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sheaths; Radio frequency;
Journal_Title :
Plasma Science, IEEE Transactions on
