• DocumentCode
    13286
  • Title

    Solution-Processed Vertical Organic Transistors Fabricated by Nanoimprint Lithography

  • Author

    Yang-Kai Wu ; Jian-Hao Huang ; Wu-Wei Tsai ; Yung-Pin Chen ; Shih-Chieh Lin ; Yung Hsu ; Hsiao-Wen Zan ; Hsin-Fei Meng ; Wang, Lon A.

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • Volume
    34
  • Issue
    2
  • fYear
    2013
  • fDate
    Feb. 2013
  • Firstpage
    313
  • Lastpage
    315
  • Abstract
    In this letter, we demonstrate the first vertical-channel organic transistor using nanoimprint technology to produce a base electrode with high-density nanometer pores to well control the channel current vertically flowing through the pores. The aspect ratios of nanopores, which determine the switching performance of the vertical transistor, are greatly enhanced by transferring the nanostructure to the underlying layers. Without pore accumulation, a low leakage current can be achieved. The vertical transistor delivers an on current of 0.35 mA/cm2 and an on/off current ratio of around 3000 at 1.8 V. The results prove the feasibility to produce low-voltage organic transistors over a large area with potentially low production cost.
  • Keywords
    electrodes; leakage currents; nanolithography; organic semiconductors; base electrode; high-density nanometer pores; low leakage current; nanoimprint lithography; on/off current ratio; solution-processed vertical organic transistors; switching performance; vertical-channel organic transistor; Aluminum; Arrays; Electrodes; Etching; Leakage current; Substrates; Transistors; Interference lithography; nanoimprint; organic transistor; solution process; vertical transistor;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2235402
  • Filename
    6413170