DocumentCode :
13286
Title :
Solution-Processed Vertical Organic Transistors Fabricated by Nanoimprint Lithography
Author :
Yang-Kai Wu ; Jian-Hao Huang ; Wu-Wei Tsai ; Yung-Pin Chen ; Shih-Chieh Lin ; Yung Hsu ; Hsiao-Wen Zan ; Hsin-Fei Meng ; Wang, Lon A.
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
34
Issue :
2
fYear :
2013
fDate :
Feb. 2013
Firstpage :
313
Lastpage :
315
Abstract :
In this letter, we demonstrate the first vertical-channel organic transistor using nanoimprint technology to produce a base electrode with high-density nanometer pores to well control the channel current vertically flowing through the pores. The aspect ratios of nanopores, which determine the switching performance of the vertical transistor, are greatly enhanced by transferring the nanostructure to the underlying layers. Without pore accumulation, a low leakage current can be achieved. The vertical transistor delivers an on current of 0.35 mA/cm2 and an on/off current ratio of around 3000 at 1.8 V. The results prove the feasibility to produce low-voltage organic transistors over a large area with potentially low production cost.
Keywords :
electrodes; leakage currents; nanolithography; organic semiconductors; base electrode; high-density nanometer pores; low leakage current; nanoimprint lithography; on/off current ratio; solution-processed vertical organic transistors; switching performance; vertical-channel organic transistor; Aluminum; Arrays; Electrodes; Etching; Leakage current; Substrates; Transistors; Interference lithography; nanoimprint; organic transistor; solution process; vertical transistor;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2235402
Filename :
6413170
Link To Document :
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