DocumentCode
13286
Title
Solution-Processed Vertical Organic Transistors Fabricated by Nanoimprint Lithography
Author
Yang-Kai Wu ; Jian-Hao Huang ; Wu-Wei Tsai ; Yung-Pin Chen ; Shih-Chieh Lin ; Yung Hsu ; Hsiao-Wen Zan ; Hsin-Fei Meng ; Wang, Lon A.
Author_Institution
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume
34
Issue
2
fYear
2013
fDate
Feb. 2013
Firstpage
313
Lastpage
315
Abstract
In this letter, we demonstrate the first vertical-channel organic transistor using nanoimprint technology to produce a base electrode with high-density nanometer pores to well control the channel current vertically flowing through the pores. The aspect ratios of nanopores, which determine the switching performance of the vertical transistor, are greatly enhanced by transferring the nanostructure to the underlying layers. Without pore accumulation, a low leakage current can be achieved. The vertical transistor delivers an on current of 0.35 mA/cm2 and an on/off current ratio of around 3000 at 1.8 V. The results prove the feasibility to produce low-voltage organic transistors over a large area with potentially low production cost.
Keywords
electrodes; leakage currents; nanolithography; organic semiconductors; base electrode; high-density nanometer pores; low leakage current; nanoimprint lithography; on/off current ratio; solution-processed vertical organic transistors; switching performance; vertical-channel organic transistor; Aluminum; Arrays; Electrodes; Etching; Leakage current; Substrates; Transistors; Interference lithography; nanoimprint; organic transistor; solution process; vertical transistor;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2235402
Filename
6413170
Link To Document